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1 article(s) from Sundberg, Pia

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

Pia Sundberg and
Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

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Figure 1: Number of articles annually published featuring organic and hybrid inorganic–organic thin films dep...

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Figure 2: Schematic illustration of purely organic thin films grown by MLD (left) and hybrid inorganic–organi...

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Figure 3: An ALD/MLD cycle consisting of the following four steps: (1) the first (inorganic) precursor is pul...

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Figure 4: Dependence of the film growth on the deposition temperature: (a) within the so-called ALD window th...

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Figure 5: Ideally, the organic precursor molecule reacts with one surface site only and remains straight (lef...

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Figure 6: Schematic illustration of ALD/MLD inorganic–organic hybrid thin films deposited by using (a) TMA wi...

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Figure 7: Schematic illustration of ALD/MLD inorganic–organic hybrid thin films deposited using TMA together ...

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Figure 8: Growth per cycle values for inorganic–organic hybrid films deposited by using TMA with different ca...

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Figure 9: Schematic illustration of an ALD/MLD inorganic–organic hybrid thin film deposited using 7-octenyltr...

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Figure 10: Electron microscope images of (a) 250 nm silica particles coated with a 25 nm thick layer of TMA+EG...

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Figure 11: Field emission scanning electron microscopy image of a nanolaminate fabricated using five bilayers ...

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Figure 12: A nanolaminate coating consisting of Al₂O₃ and TMA+EG alucone layers with targeted thicknesses of 2...

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Figure 13: An HRTEM image of a capacitor memory device fabricated by using Al-containing hybrid (marked as AlO...

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Review

Published 22 Jul 2014

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